Difference between revisions of "Projects:SlicerFAQ"

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*[[Projects:SlicerFAQ:RegistrationRerun|Registration result is wrong or worse than before?]]
 
*[[Projects:SlicerFAQ:RegistrationRerun|Registration result is wrong or worse than before?]]
 
*[[Projects:SlicerFAQ:SamplePoints|How many sample points should I choose for my registration?]]
 
*[[Projects:SlicerFAQ:SamplePoints|How many sample points should I choose for my registration?]]
*I want to register two images with different intensity/contrast
+
*[[Projects:SlicerFAQ:RegistrationContrast|I want to register two images with different intensity/contrast.]]
 
*how important is bias field correction / intensity inhomogeneity correction?
 
*how important is bias field correction / intensity inhomogeneity correction?
*what is the purpose of masking?
 

Revision as of 14:06, 17 November 2010

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