Difference between revisions of "Projects:SlicerFAQ"
From NAMIC Wiki
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*Registration failed with an error. What should I try next? | *Registration failed with an error. What should I try next? | ||
*[[Projects:SlicerFAQ:RegistrationRerun|Registration result is wrong or worse than before?]] | *[[Projects:SlicerFAQ:RegistrationRerun|Registration result is wrong or worse than before?]] | ||
+ | *[[Projects:SlicerFAQ:SamplePoints|How many sample points should I choose for my registration?]] | ||
*I want to register two images with different intensity/contrast | *I want to register two images with different intensity/contrast | ||
*how important is bias field correction / intensity inhomogeneity correction? | *how important is bias field correction / intensity inhomogeneity correction? | ||
*what is the purpose of masking? | *what is the purpose of masking? |
Revision as of 14:21, 16 November 2010
Home < Projects:SlicerFAQImage Loading & Viewing
- How do I fix a wrong image orientation? / My image appears upside down / facing the wrong way / I have incorrect/missing axis orientation
- what do the coordinate labels R,A,S and (negative numbers) mean?
- How do I fix incorrect voxel size / aspect ratio of a loaded image volume?
Registration
- two images are very far apart / do not overlap
- How do I register a DWI image dataset to a structural reference scan? (Cookbook)
- Can I manually adjust or correct a registration?
- What's the difference between the various registration methods listed in Slicer?
- What's the purpose of masking / VOI in registration?
- Registration failed with an error. What should I try next?
- Registration result is wrong or worse than before?
- How many sample points should I choose for my registration?
- I want to register two images with different intensity/contrast
- how important is bias field correction / intensity inhomogeneity correction?
- what is the purpose of masking?